Applicable to semiconductor photolithography, inspection equipment, and optical masks;
◆A variety of materials are available for selection;
◆Surface Roughness (Å) is better than 0.1nm
◆Supports small batch customization
Optical Lenses and Substrates
Ultra-smooth Optical Substrate
Surface Roughness (Å) is better than 0.1nm;Supports small batch customization
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Optical Lenses and SubstratesUltra-high Precision Aspheric Lenses
Surface Accuracy RMS exceed λ/100 ;Build-to-Print Capabilities
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